Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, pattern forming method, process for manufacturing electronic device and electronic device

An actinic-ray- or radiation-sensitive resin composition comprising a compound (A) that is configured to produce an acid when exposed to actinic rays or radiation, the compound expressed by general formula (1) or (2) below, and a resin (B) containing a repeating unit (b) containing a group that is configured to decompose when acted on by an acid to thereby produce an alcoholic hydroxyl group,

• in general formula (1),
• R1A represents a linear, branched-chain or cyclic organic group;
• each of R2A and R3A independently represents a hydrogen atom, a methyl group or CF3;
• R4A represents a hydrogen atom, a hydroxyl group, a linear or branched-chain alkyl group, a cycloalkyl group, a linear, branched-chain or cyclic alkyloxy group or any of groups of general formula (1a) below, provided that a fluorine atom may be contained in each of the alkyl group and the alkyloxy group;
• and
• XA represents an alkylene chain in which a heteroatom may be contained, the alkylene chain constructing a ring in cooperation with the S atom in the formula, and
• in general formula (2),
• R1B represents a linear, branched-chain or cyclic organic group;
• R4B represents a hydrogen atom, a hydroxyl group, a linear or branched-chain alkyl group, a cycloalkyl group, a linear, branched-chain or cyclic alkyloxy group or any of groups of general formula (1a) below, provided that a fluorine atom may be contained in each of the alkyl group and the alkyloxy group;
• XB represents an alkylene chain in which a heteroatom may be contained, the alkylene chain constructing a ring in cooperation with the S atom in the formula;
• and
• nB is 0 or 1,
• in general formula (1a),
• n is an integer of 1 or greater;
• and
• * represents a site of bonding to the naphthyl group in general formula (1) or (2).