Optically transparent and electrically conductive coatings and method for their deposition on a substrate
AssigneesFundació Institut De CièNcies FotòNiques, Cark Zeiss SMT GmbH
InventorsValerio Pruneri, Albert Carrilero, Jan-Hendrik Peters
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Abstract
The present inventions relates to a substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, wherein the coating comprises (a) at least one electrically conducting layer, and (b) wherein a thickness of the at least one layer is smaller than 30 nm, preferably smaller than 20 nm, and most preferably smaller than 10 nm.
Claims34
A substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, the coating comprising:
- a. at least one electrically conducting layer, wherein the at least one electrically conducting layer comprises at least one first layer comprising at least one first layer comprising at least one metal and at least one second layer comprising at least one metal nitride, and wherein the at least one metal of the at least one first layer comprises nickel (Ni), chromium (Cr) or titanium (Ti);
- b. wherein a thickness of the at least one electrically conducting layer is smaller than 30 nm;
- c. wherein the at least one electrically conducting layer comprises an optical transmittance of more than 20% in the wavelength range of 300 nm to 1100 nm;
- and
- d. wherein the at least one second layer protects the at least one first layer.
A method for depositing a coating on a substrate of a photolithographic mask, the method comprising:
- a. depositing at least one electrically conducting layer on the substrate, wherein the at least one electrically conducting layer comprises at least one first layer comprising at least one metal and at least one second layer comprising at least one metal nitride, and wherein the at least one metal of the at least one first layer comprises nickel (Ni), chromium (Cr) or titanium (Ti);
- b. wherein a thickness of the at least one electrically conducting layer is smaller than 30 nm;
- c. wherein the at least one electrically conducting layer comprises an optical transmittance of more than 20% in the wavelength range of 300 nm to 1100 nm;
- and
- d. wherein the at least one second layer protects the at least one first layer.
A substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, the coating comprising:
- at least one electrically conducting layer;
- wherein a thickness of the at least one electrically conducting layer is smaller than 30 nm, and the at least one electrically conducting layer comprises at least one of graphene or a multilayer structure of graphite.
A substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, the coating comprising:
- at least one electrically conducting layer;
- wherein a thickness of the at least one electrically conducting layer is smaller than 30 nm, and the at least one electrically conducting layer comprises at least one first layer comprising at least one graphene single layer or graphene multilayer structure and at least one second layer comprising at least one of metal oxide or metal nitride.
A substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, the coating comprising:
- at least one electrically conducting layer;
- wherein a thickness of the at least one electrically conducting layer is smaller than 30 nm, the at least one electrically conducting layer has an optical transmittance of more than 60%, and the at least one electrically conducting layer comprises at least one of graphene or a multilayer structure of graphite.
A substrate for a photolithographic mask comprising a coating deposited on a rear surface of the substrate, the coating comprising:
- at least one electrically conducting layer;
- wherein a thickness of the at least one electrically conducting layer is smaller than 30 nm, the at least one electrically conducting layer has an optical transmittance of more than 60%, and the at least one electrically conducting layer comprises at least one first layer and at least one second layer, and
- wherein the at least one first layer comprises at least one first metal and the at least one second layer comprises at least one of a second metal or graphene.
Dependencies are inferred from the claim text.