Manufacturing method of display device

A method of manufacturing a display device comprising:

• adhering a first auxiliary substrate on a first substrate;
• forming a TFT array on an inner surface of the first substrate, the TFT array comprising:
• a gate line,
• a data line intersecting the gate line,
• a TFT connected to the gate line and the data line, the TFT including an oxide semiconductor layer selected from a group consisting of zinc oxide, indium gallium oxide and indium-zinc-tin oxide,
• an organic layer arranged on the TFT and being perforated by a contact hole,
• a pixel electrode arranged on the organic layer and connected to the TFT via the contact hole, and
• a common electrode arranged to be insulated from the pixel electrode;
• forming a rear electrode on a second substrate;
• adhering a second auxiliary substrate on the rear electrode so that the rear electrode is positioned between the second substrate and the second auxiliary substrate;
• disposing a liquid crystal layer between the first substrate and the second substrate;
• adhering the first substrate and the second substrate together;
• and
• removing the first auxiliary substrate and the second auxiliary substrate from the first substrate and the second substrate, respectively, by applying a shear force on an end portion of the first auxiliary substrate or the second auxiliary substrate.