Display device and manufacturing method thereof

A manufacturing method of a display device, the method comprising:

• forming a thin film transistor on a substrate, the substrate including a plurality of pixel areas;
• forming a first insulating layer on the thin film transistor;
• forming a pixel electrode connected with the thin film transistor on the first insulating layer;
• forming a color filter between the substrate and the pixel electrode;
• forming a sacrificial layer on the pixel electrode;
• forming a common electrode on the sacrificial layer;
• forming a second insulating layer on the common electrode;
• forming a roof layer by applying and patterning an organic material onto the second insulating layer, a thickness of the roof layer being about 4 μm to about 50 μm;
• exposing the sacrificial layer;
• forming a microcavity between the pixel electrode and the common electrode by removing the exposed sacrificial layer;
• forming an injection hole through the common electrode, the second insulating layer, and the roof layer, the injection hole exposing a part of the microcavity;
• forming a liquid crystal layer by injecting a liquid crystal material into the microcavity;
• forming an overcoat on the roof layer and in the injection hole, such that the overcoat seals the microcavity;
• and
• forming a third insulating layer between the overcoat and the roof layer.