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US 9,519,080 B2Granted
High-aspect-ratio imprinted structure
AssigneeEastman Kodak Company
InventorRonald Steven Cok
Life of this patent
Estimating the term…
Abstract
A high-aspect-ratio imprinted structure includes a first layer of cured layer material having a plurality of micro-channels imprinted in the first layer. Each micro-channel has micro-channel walls and a micro-channel bottom, the micro-channel bottom having distinct first and second portions. Deposited material is located on the micro-channel walls and not on the second portion of the micro-channel bottom.
Claims20
A high-aspect-ratio imprinted structure, comprising:
- a first layer of cured layer material having a surface and a plurality of micro-channels imprinted in the first layer, each micro-channel having a length, micro-channel walls, and a micro-channel bottom, the micro-channel bottom having distinct first and second portions;
- and
- deposited material located on the micro-channel walls and not on the second portion of the micro-channel bottom, wherein the micro-channels extend over the first layer to define a length, and wherein the micro-channels and the deposited material on the micro-channel walls have a substantially rectangular cross section taken in a direction perpendicular to the length of the micro-channels and perpendicular to the surface of the first layer, and wherein the deposited material has a transmissivity of less than 50% and is not present on the surface of the first layer.
Dependencies are inferred from the claim text.