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US 9,518,357 B2Granted
Mark-fabric material and mark forming method
AssigneeHoulaisha Co., Ltd.
InventorsShigeji Higashiguchi, Shinichi Nagai
Life of this patent
Estimating the term…
Abstract
A mark-fabric material includes a mark-fabric including, in the following sequence, microfibers, an adhesive layer including a thermoplastic resin having a melt flow rate of 100 g/10 min or less, and a release sheet.
Claims18
A mark-fabric material, comprising, in the following sequence:
- a mark-fabric comprising microfibers having a fiber diameter of 10 μm or less;
- an adhesive layer including a thermoplastic resin having a melt flow rate of 100 g/10 min or less;
- and
- a release sheet.
1 more element
A mark forming method, comprising:
- forming a pattern with a sublimating dye on a mark-fabric material including, in the following sequence, a mark-fabric comprising microfibers having a fiber diameter of 10 μm or less, an adhesive layer including a thermoplastic resin having a melt flow rate of 100 g/10 min or less, and a release sheet, by sublimation transfer using sublimation conditions of from 185° C. to 210° C. and from 30 seconds to 90 seconds.
Dependencies are inferred from the claim text.