Method for producing a doped SiO2 slurry and use of the SiO2 slurry
AssigneeHeraeus Quarzglas GmbH & Co. KG
InventorsMario Such, Gerhard Schoetz, Andreas Langner
Life of this patent
Estimating the term…
Abstract
The invention relates to a method for producing a doped SiO2 slurry in which an SiO2 suspension is brought into interaction with at least one doping solution, wherein the SiO2 suspension and/or the doping solution act on one another in the form of an atomized spray, the average droplet diameter of which is in the range between 10 μm and 100 μm. The invention further relates to the use of an SiO2 slurry doped by the atomized spray method for the production of doped quartz glass, particularly for the production of laser-active quartz glass.
Claims11
A method for producing a doped SiO2 slurry, said method comprising:
- providing at least one doping solution continually to a SiO2 suspension that contains SiO2 particles in an aqueous liquid so as to form the doped SiO2 slurry,
- wherein, while the doped SiO2 slurry is being formed, an at least partially doped SiO2 slurry is continuously kept in motion, and
- wherein the SiO2 suspension and the doping solution act on each other with the SiO2 suspension and/or the doping solution being in the form of a spray mist having a mean drop diameter that is in a range between 10 μm and 100 μm.
Dependencies are inferred from the claim text.