System and method for generating extreme ultraviolet light
AssigneeGigaphoton Inc.
InventorsMasato Moriya, Osamu Wakabayashi
Life of this patent
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Abstract
A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image.
Claims11
A system for generating extreme ultraviolet light, comprising:
- a chamber;
- a target supply device configured to supply a target material to a specific region in the chamber;
- a first laser apparatus configured to output a first laser beam to irradiate the target material;
- an optical system configured to focus the first laser beam outputted from the first laser apparatus;
- a detector configured to detect a backpropagating beam of the first laser beam reflected by the target material;
- and
- a controller configured to control a focus position of the optical system based on the backpropagating beam detected by the detector.
A method for generating extreme ultraviolet light in a system which includes a chamber, a target supply device configured to supply a target material to a specific region in the chamber, a first laser apparatus configured to output a first laser beam to irradiate the target material, an optical system configured to focus the first laser beam outputted from the first laser apparatus, a detector configured to detect a laser beam reflected by the target material, and a controller configured to control a focus position of the optical system, the method comprising:
- detecting, by the detector, a backpropagating beam of the first laser beam reflected by the target material;
- and
- controlling, by the controller, the focus position of the optical system based on the backpropagating beam detected by the detector.
Dependencies are inferred from the claim text.