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US 9,437,537 B2Granted
Semiconductor device and method of manufacturing the same
AssigneeSK hynix Inc.
InventorsHyun Sub Kim, Sung Bo Shim
Life of this patent
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Abstract
A semiconductor device including conductive lines configured to include first lines extending generally in parallel in a first direction and second lines extending generally in parallel in a second direction to intersect the first direction from the respective ends of the first lines and each second line having a width wider than the first line, and dummy patterns formed between the second lines.
Claims13
A semiconductor device, comprising:
- conductive lines configured to include first lines extending generally in parallel in a first direction and second lines extending generally in parallel in a second direction to intersect the first direction from respective ends of the first lines;
- dummy patterns formed generally between the second lines;
- and
- a contact plug
- wherein each second line has a width wider than the first line, such that the contact plug is aligned on one of the second lines.
2 more elements
Dependencies are inferred from the claim text.