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AssigneeEbara Corporation
InventorsAkira Nakamura, Hiroaki Shibue, Yasumasa Hiroo, Hiroshi Ota, Taro Takahashi, Mitsuo Tada
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The polishing process includes a first state where an eddy current sensor and a polishing target object do not face each other and a second state where the eddy current sensor and the polishing target object face each other. The method of correcting a film thickness measurement value includes obtaining a first measurement signal (Xout, Yout) output from the eddy current sensor in the first state (step S108), computing a correction value (ΔX, ΔY) on the basis of the obtained first measurement signal and a reference signal (Xsd, Ysd) set in advance, obtaining a second measurement signal (X, Y) output from the eddy current sensor in the second state (step S104), and correcting the obtained second measurement signal on the basis of the computed correction value while the polishing process is being performed (step S105).
A method of correcting a film thickness measurement value in which a signal output from a sensor for measuring a film thickness of a polishing target object is corrected while a process of polishing the polishing target object is being performed, the polishing process including a first state where the sensor and the polishing target object do not face each other and a second state where the sensor and the polishing target object face each other, the method comprising:
A film thickness corrector configured to correct a signal output from a sensor for measuring a film thickness of a polishing target object while a process of polishing the polishing target object is being performed, the polishing process including a first state where the sensor and the polishing target object do not face each other and a second state where the sensor and the polishing target object face each other, the film thickness corrector comprising:
An eddy current sensor configured to measure a distance to a measurement target object or a film thickness of the measurement target object, the eddy current sensor comprising:
Dependencies are inferred from the claim text.