Method of manufacturing a wiring substrate
AssigneeSeiko Epson Corporation
InventorTsuyoshi Yoda
Life of this patent
Estimating the term…
Loading patent…
AssigneeSeiko Epson Corporation
InventorTsuyoshi Yoda
Estimating the term…
A method of manufacturing a wiring substrate including a step of forming a through hole that includes forming a first concave portion in a substrate that extends from a second surface to a first insulating layer without passing through the first insulating layer; forming a second insulating layer at least within the first concave portion; and forming a second concave portion through the second insulating layer and the first insulating layer to expose a surface of a pad electrode, wherein the second concave portion is formed within the first concave portion; and filling the first concave portion and the second concave portion with a conductive body or forming the conductive body to coat inner walls of the first concave portion and the second concave portion, and forming the through electrode such that it is connected to the pad electrode.
A method of manufacturing a wiring substrate which includes a substrate which has a first surface and a second surface, a first insulating layer which is stacked on the first surface of the substrate, a pad electrode which is formed on the first insulating layer, and a through electrode which passes through the substrate and the first insulating layer, comprising:
Dependencies are inferred from the claim text.