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US 9,437,463 B2Granted
Heating device
AssigneeNGK Insulators, Ltd.
InventorsNobuyuki Kondo, Morimichi Watanabe, Asumi Jindo, Yuji Katsuda, Yosuke Sato, Yoshinori Isoda
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Abstract
A heating apparatus includes a susceptor having a heating face of heating a semiconductor and a supporting part joined with a back face of the susceptor. The susceptor comprises a ceramic material comprising magnesium, aluminum, oxygen and nitrogen as main components. The material comprises a main phase comprising magnesium-aluminum oxynitride phase exhibiting an XRD peak at least in 2θ=47 to 50° by CuKα X-ray.
Claims10
A heating apparatus for a semiconductor manufacturing system comprising:
- a susceptor comprising a heating face of heating a semiconductor and a back face and a supporting part bonded with said back face of said susceptor,
- wherein said susceptor comprises a ceramic material comprising magnesium, aluminum, oxygen and nitrogen as main components, and
- wherein said ceramic material comprises at least 50 vol % magnesium-aluminum oxynitride phase exhibiting an XRD peak at least in 2θ=47 to 50° taken by using CuKα ray.
Dependencies are inferred from the claim text.