US 9,437,399 B2Granted

Plasma equipment

AssigneeIndustry-University Cooperation Foundation Hanyang University

InventorsChin-Wook Chung, Jin-Young Bang, Hee-Jin Lee

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Abstract

There is provided plasma equipment including a power supply that supplies a RF power; a chamber in which plasma is generated, and a processing target to processed by the plasma is provided; an antenna coil that is provided on a top surface of the chamber, and is connected to the power supply to receive the RF power; and a resonance coil that is provided to be electrically insulated or cut off from the antenna coil. The resonance coil receives electromagnetic energy applied from the antenna coil to allow a current to flow, and the plasma is generated within the chamber. It is possible to increase the degree of freedom for an installation position of the resonance coil, and it is possible to increase plasma density.

Claims12

Dependent claims

Plasma equipment comprising:

a power supply that supplies a RF power;
a chamber configured to generate plasma and process a processing target by using the plasma;
an antenna coil that is provided on a top surface of the chamber, and is directly connected to the power supply to receive the RF power;
a resonance coil that is provided to be electrically insulated or separated from the antenna coil and provided to be not connected to the antenna coil and the power supply;
and
a variable capacitor that is connected to the resonance coil in parallel so as to allow the resonance coil to cause an electromagnetic inductive resonance,
wherein the resonance coil receives electromagnetic energy from the antenna coil in a wireless power transmitting manner by the electromagnetic inductive resonance to allow a current to flow, and the plasma is generated within the chamber, and the current flowing in the resonance coil that wirelessly receives the power from the antenna coil to cause the resonance may be varied by adjusting a size of the variable capacitor, and the plasma generated within the chamber can be controlled by adjusting the size of the variable capacitor.

4 more elements

Dependencies are inferred from the claim text.

Facts

Application: 14/400,306Filed 16 May 2013
Priority: KR 10-2012-005229317 May 2012
Published: US 2015/0097480 A19 Apr 2015
Granted: 6 Sep 2016
Term ends: Not estimatedThe source records don’t support an estimate.

Classification9 codes

H01J 37/3211
The radio frequency energy being inductively coupled to the plasma: antennas, e.g. particular shapes of coils
H01F 38/14
Adaptations of transformers or inductances for specific applications or functions: inductive couplings
H01J 37/32183
Circuits specially adapted for controlling the RF discharge: matching circuits
H05H 1/46
Generating plasma: using applied electromagnetic fields, e.g. high frequency or microwave energy

Family

US 2015/0097480 A1Pre-grant publication · published 9 Apr 2015
US 9,437,399 B2This patent

From the US filing history. Foreign family members aren’t listed.

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