Textured silicon liners in substrate processing systems
AssigneeVarian Semiconductor Equipment Associates, Inc.
InventorJulian Blake
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Abstract
Substrate processing systems, such as ion implantation systems, deposition systems and etch systems, having textured silicon liners are disclosed. The silicon liners are textured using a chemical treatment that produces small features, referred to as micropyramids, which may be less than 20 micrometers in height. Despite the fact that these micropyramids are much smaller than the textured features commonly found in graphite liners, the textured silicon is able to hold deposited coatings and resist flaking. Methods for performing preventative maintenance on these substrate processing systems are also disclosed.
Claims17
An ion implantation system, comprising:
- an ion source;
- a process chamber in which a substrate is disposed;
- and
- a silicon liner, disposed within said system, where a surface of said silicon liner is textured, wherein said textured surface of said silicon liner comprises micropyramids having a height of less than 20 micrometers.
A beamline ion implantation system, comprising:
- an ion source;
- an electrode disposed outside said ion source to attract ions generated within said ion source to form an ion beam;
- a mass analyzer through which said ion beam passes;
- a resolving aperture at an output of said mass analyzer to allow ions of a desired charge/mass ratio to pass;
- a focusing element in a path of said ion beam to focus said ion beam;
- a process chamber in which a substrate is disposed;
- and
- a silicon liner disposed on a shield around said resolving aperture or on said focusing element, wherein a surface of said silicon liner facing said ion beam is chemically textured, such that said textured surface comprises micropyramids having a height of less than 20 micrometers.
Dependencies are inferred from the claim text.