Wynne-Dyson projection lens with reduced susceptibility to UV damage
AssigneeUltratech, Inc.
InventorsPeiqian Zhao, Emily M. True, Raymond Ellis, Andrew M. Hawryluk
Life of this patent
Estimating the term…
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AssigneeUltratech, Inc.
InventorsPeiqian Zhao, Emily M. True, Raymond Ellis, Andrew M. Hawryluk
Estimating the term…
A Wynne-Dyson projection lens for use in an ultraviolet optical lithography system is disclosed, wherein the projection lens is configured to have reduced susceptibility to damage from ultraviolet radiation. The projection lens utilizes lens elements that are made of optical glasses that are resistant to damage from ultraviolet radiation, but that also provide sufficient degrees of freedom to correct aberrations. The glass types used for the lens elements are selected from the group of optical glasses consisting of: fused silica, S-FPL51Y, S-FSL5Y, BSM51Y and BAL15Y.
A Wynne-Dyson projection lens having object and image planes and an image field, and that has reduced susceptibility to compaction from ultraviolet radiation, the lens comprising along an optical axis:
A Wynne-Dyson projection lens having object and image planes and an image field, and that has reduced susceptibility to compaction from ultraviolet radiation, the lens comprising along an optical axis:
A Wynne-Dyson projection lens having object and image planes and an image field, and that has reduced susceptibility to compaction from ultraviolet radiation, the lens comprising along an optical axis:
Dependencies are inferred from the claim text.