A method of making an exposure apparatus that exposes a substrate with an exposure beam via a projection system, the method comprising:
- supporting the projection system with a frame;
- placing a base under the projection system supported by the frame;
- placing a substrate stage having a table that mounts the substrate, on the base;
- providing a measurement device that has a plurality of heads that are provided at the table and each irradiate a measurement beam on a grating section supported by the frame, and measures positional information of the table by a head, of the plurality of heads, that faces the grating section;
- providing a drive device that drives the substrate stage supported by levitation on the base, to move the substrate;
- providing a measurement system that measures, in a noncontact manner, displacement information, at the table, of a head used in measurement of the positional information;
- and
- providing a controller that controls the drive device to drive the substrate stage based on the displacement information measured by the measurement system and the positional information measured by the measurement device.