Chemically-amplified negative resist composition and resist patterning process using the same

A chemically-amplified negative resist composition for high energy beam exposure comprising:

• (A) a salt represented by the following general formula (1);
• and (B) a resin containing one or more kinds of repeating units represented by the following general formulae (UN-1) and (UN-2),
• wherein R0 represents a hydrogen atom, or a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms with which a hetero atom may be substituted or in which a hetero atom may be included;
• each R01 and R02 independently represents a hydrogen atom, or a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms, and R01 and R02 may mutually be bonded to form a cyclic structure together with a carbon atom bonded by the same and a carbon atom between the same, and at least one of R0, R01 and R02 has a cyclic structure;
• each R101, R102 and R103 independently represents a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or a cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms with which a hetero atom may be substituted or in which a hetero atom may be included, and two or more of R101, R102 and R103 may mutually be bonded to form a cyclic structure together with a sulfur atom in the formula;
• and L represents a single bond or any of an ester bond, a sulfonic acid ester bond, a carbonate bond and a carbamate bond each of which is formed together with an adjacent oxygen atom,
• wherein each A and B represents a single bond or an alkylene group having 1 to 10 carbon atoms that may contain an ether bond in a chain of the alkylene group;
• each R1 independently represents a hydrogen atom or a methyl group;
• RX represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms;
• X represents a hydrogen atom, a linear, a branched or a cyclic alkyl group, substituted or unsubstituted, having 1 to 20 carbon atoms, an alkoxyalkyl group having 2 to 20 carbon atoms, an alkylthioalkyl group having 2 to 20 carbon atoms, a halogen atom, a nitro group, a cyano group, a sulfinyl group, or a sulfonyl group;
• Y represents an alkyl group having 1 to 20 carbon atoms or an acyl group having 1 to 20 carbon atoms;
• “a” and “c” represent an integer of 0 to 4;
• “b” represents an integer of 1 to 5;
• “d” represents an integer of 0 to 5;
• P and Q represent 0 or 1;
• and “s” and “t” represent an integer of 0 to 2.