Microwave plasma and ultraviolet assisted deposition apparatus and method for material deposition using the same

An apparatus for depositing a material on a substrate, the apparatus comprising:

• a processing chamber defining a processing space in which the substrate is arranged;
• an ultraviolet radiation assembly configured to emit ultraviolet radiation into the processing space;
• a microwave radiation assembly configured to emit microwave radiation into the processing space;
• and
• a gas feed assembly configured to feed:
• a precursor gas into the processing space, and
• a reactive gas into the processing space,
• wherein the gas feed assembly comprises a plurality of conduits, and
• wherein each of the plurality of conduits comprises:
• a coaxial inner conduit and outer conduit,
• wherein the inner conduit defines a port through which the precursor gas or the reactive gas is fed into the processing space, and
• wherein the inner conduit is configured to move relative to the outer conduit to position the port at a variable position in the processing space, wherein:
• the ultraviolet radiation assembly and the microwave radiation assembly are configured to be operated in combination to emit ultraviolet radiation and microwave radiation to excite at least the reactive gas in the processing space, and
• the material is deposited on the substrate in the processing space from the reaction of the precursor gas and the excited reactive gas.