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US 9,433,967 B2Granted
Pattern inspection method, pattern formation control method, and pattern inspection apparatus
AssigneeKabushiki Kaisha Toshiba
InventorMasafumi Asano
Life of this patent
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Abstract
According to one embodiment, in a pattern inspection method, a guide pattern is formed on a substrate. A block copolymer is applied on the guide pattern. Thereafter, the substrate is heated according to a predetermined heating condition to promote directed self assembly corresponding to a shape of the guide pattern with respect to the block copolymer. Further, the substrate is observed by a fluorescence microscope during heating or after heating the substrate.
Claims8
A pattern inspection apparatus comprising:
- an application unit that applies a block copolymer on a substrate;
- a heating unit that heats the substrate according to a predetermined heating condition, and that promotes directed self assembly of the block copolymer, the directed self assembly corresponding to a shape of a guide pattern formed on the substrate
- an observation unit that observes the substrate by a fluorescence microscope during heating or after heating the substrate;
- and
- a control unit that changes the heating condition,
- wherein,
- in the heating unit, a heating area of the substrate is divided into a plurality of regions, and
- the control unit changes the heating condition in units of the regions.
5 more elements
Dependencies are inferred from the claim text.