Method and system of chemical bath deposition
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorPei-Chen Tsai
Life of this patent
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Abstract
An apparatus for chemical bath deposition includes a housing defining a chemical tank, a circulation pipe, and at least one flow adjustment device disposed inside the chemical tank. The chemical tank has an opening on a top surface and is configured to accept and hold at least one substrate inside the chemical tank. The circulation pipe has at least one portion inside the chemical tank, and is configured to supply at least one chemical to the chemical tank. The at least one flowing adjustment device includes any one of a turbine, a diffuser and a bubbler, or a combination thereof.
Claims16
An apparatus for chemical bath deposition, comprising:
- a housing defining a chemical tank, the chemical tank having an opening on a top surface and configured to accept and hold at least one substrate therein;
- a circulation pipe, having at least one horizontal portion inside the chemical tank, and configured to supply at least one chemical to the chemical tank;
- and
- at least one flow adjustment device disposed inside the chemical tank, the at least one flowing adjustment device comprising a turbine or a diffuser,
- wherein the at least one horizontal portion of the circulation pipe inside the chemical tank has a plurality of vent holes configured to provide the chemical from the circulation pipe to the chemical tank;
- wherein the turbine is a reversible turbine disposed adjacent to one side wall of the chemical tank, the one side wall being a vertical wall.
An apparatus for chemical bath deposition, comprising:
- a housing defining a chemical tank, the chemical tank having an opening on a top surface and configured to accept and hold at least one substrate therein;
- a circulation pipe, having at least one horizontal portion inside the chemical tank, and configured to supply at least one chemical to the chemical tank;
- and
- at least one flow adjustment device disposed inside the chemical tank, the at least one flowing adjustment device comprising
- a turbine disposed adjacent to one side wall of the chemical tank, and
- a diffuser disposed above the circulation pipe,
- wherein the at least one horizontal portion of the circulation pipe inside the chemical tank has a plurality of vent holes configured to provide the chemical from the circulation pipe to the chemical tank;
- wherein the turbine is a reversible turbine disposed adjacent to one side wall of the chemical tank, the one side wall being a vertical wall.
An apparatus for chemical bath deposition, comprising:
- a housing defining a chemical tank, the chemical tank having an opening on a top surface and configured to accept and hold at least one substrate therein;
- a circulation pipe, having at least one horizontal portion inside the chemical tank, and configured to supply at least one chemical to the chemical tank;
- and
- at least one flow adjustment device disposed inside the chemical tank, wherein the at least one flow adjustment device comprises a combination of two or more selected from the group consisting of a turbine, a diffuser and a bubbler,
- wherein the at least one horizontal portion of the circulation pipe inside the chemical tank has a plurality of vent holes configured to provide the chemical from the circulation pipe to the chemical tank;
- wherein the turbine is a reversible turbine disposed adjacent to one side wall of the chemical tank, the one side wall being a vertical wall.
Dependencies are inferred from the claim text.