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US 9,431,343 B1Granted
Stacked damascene structures for microelectronic devices
AssigneeSamsung Electronics Co., Ltd.
InventorsKi-Don Lee, Jinseok Kim
Life of this patent
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Abstract
A microelectronic device includes a dual-damascene interconnect structure and a single-damascene line structure directly on the dual-damascene interconnect structure. The dual-damascene interconnect structure and the single-damascene line structure may each include multiple line segments that are arranged in a brick wall pattern. The brick wall pattern may also be used with two or more single-damascene line structures. Various microelectronic devices and related fabrication methods are described.
Claims19
A microelectronic device comprising:
- a microelectronic substrate;
- a dual-damascene interconnect structure on the microelectronic substrate, the dual-damascene interconnect structure comprising a conductive via and a first conductive line directly on the conductive via opposite the microelectronic substrate;
- and
- a single-damascene line structure directly on the dual-damascene interconnect structure, the single-damascene line structure comprising a second conductive line on the first conductive line opposite the conductive via.
1 more element
A microelectronic device comprising:
- a microelectronic substrate;
- a first conductive line on the microelectronic substrate, the first conductive line comprising a plurality of first conductive line segments including at least one first gap therebetween;
- and
- a second conductive line directly on the first conductive line opposite the microelectronic substrate, the second conductive line comprising a plurality of second conductive line segments including at least one second gap therebetween;
- wherein the at least one first gap is laterally offset from the at least one second gap.
2 more elements
A microelectronic device comprising:
- a damascene structure;
- and
- a single-damascene line structure directly on the damascene structure,
- wherein the damascene structure and the single-damascene line structure each comprise a plurality of line segments that are arranged in a brick wall pattern.
1 more element
Dependencies are inferred from the claim text.