Heater block and a substrate treatment apparatus
AssigneeAp Systems Inc.
InventorsChang-Kyo Kim, Sung-Chul Kim, Chang-Min Kwon, Ki-Nam Kim
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Abstract
The present invention relates to a heater block and a substrate treatment apparatus, and more particularly to a heater block to perform heat treatment on a substrate and a substrate treatment apparatus having the same. According to embodiments of the present invention, it is provided a heater block for a substrate treatment apparatus having heating lamps on its one side to transfer heat to a target subjected to heat treatment, the heating lamps having different arrangement patterns in a plurality of regions on said one side.
Claims14
A heater block for a substrate treatment apparatus, the heater block comprising:
- heating lamps positioned to transfer heat from one side of the heater block to a target subjected to heat treatment,
- wherein the heating lamps have different arrangement patterns in a plurality of regions on said one side,
- wherein the plurality of regions are divided into a central region at an innermost portion of said one side of the heater block and a peripheral region external to the central region,
- wherein the heating lamps include circular shaped heating lamps and T-shaped heating lamps,
- wherein the circular shaped heating lamps are disposed on the central region and the T-shaped heating lamps heating lamps are disposed on the peripheral region;
- wherein the peripheral region is divided into a plurality of regions along a distance from a central point;
- and
- wherein the heating lamps disposed on the peripheral region have a combined arrangement of at least two or more arrangements among a concentric arrangement, a tessellated arrangement, and a linear arrangement.
A substrate treatment apparatus comprising:
- a processing chamber having a space for heat treatment on a substrate;
- and
- a heater block comprising:
- heating lamps generating heat energy,
- wherein the heating lamps have different arrangement patterns in a plurality of regions on one side of the heater block;
- and
- a quartz window to maintain a sealing between the processing chamber and a heating housing and to pass through heat energy reflected by the heating housing to transfer it to the substrate,
- wherein the plurality of regions are divided into a central region at an innermost portion of said one side of the heater block and a peripheral region external to the central region;
- and
- wherein the heating lamps include circular shaped heating lamps and T-shaped heating lamps, the circular shaped heating lamps are disposed on the central region and the T-shaped heating lamps heating lamps are disposed on the peripheral region;
- wherein the peripheral region is divided into a plurality of regions along a distance from a central point;
- and
- wherein the heating lamps disposed on the peripheral region have a combined arrangement of at least two or more arrangements among a concentric arrangement, a tessellated arrangement, and a linear arrangement.
A heater block for a substrate treatment comprising:
- a plurality of first heating lamps mounted on a central region of a surface of the heater block;
- a plurality of second heating lamps mounted on a peripheral region of the surface of the heater block;
- wherein the peripheral region is external to the central region;
- wherein the plurality of first heating lamps have a shape different from that of the second heating lamps;
- and
- wherein the plurality of first heating lamps are arranged in a pattern different from that of the plurality of second heating lamps;
- wherein the peripheral region is divided into a plurality of regions along a distance from a central point;
- and
- wherein the plurality of second heating lamps have a combined arrangement, in the divided regions, of at least two or more arrangements among a concentric arrangement, a tessellated arrangement, and a linear arrangement.
Dependencies are inferred from the claim text.