Wavefront modification apparatus, lithographic apparatus and method
AssigneeASML Netherlands B.V.
InventorRuslan Akhmedovich Sepkhanov
Life of this patent
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Abstract
A wavefront modification apparatus that has a plurality of acoustic emitters, the acoustic emitters configured to emit acoustic waves which travel at least partially across a radiation beam conduit. The acoustic emitters may be configured to establish a standing acoustic wave which extends at least partially across the radiation beam conduit. The wavefront modification apparatus may be provided in a lithographic apparatus, and may be used to modify the wavefront of a radiation beam which is used by the lithographic apparatus to project a pattern onto a substrate.
Claims20
An apparatus comprising:
- a plurality of acoustic emitters, the acoustic emitters configured to emit acoustic waves which travel at least partially across a radiation beam conduit to modify a wavefront of a radiation beam passing through the radiation beam conduit;
- and
- a control system configured to variably control at least two emitters of the plurality of acoustic emitters to adjust a phase of the acoustic waves from a first emitter of the at least two emitters to be different than a phase of the acoustic waves from a second emitter of the at least two emitters for a same time when the first emitter and the second emitter emit acoustic waves to the radiation beam conduit.
A lithographic apparatus comprising:
- a substrate table to hold a substrate;
- a projection system to project a patterned radiation beam onto a target portion of the substrate;
- and
- a wavefront modification apparatus comprising a plurality of acoustic emitters, the acoustic emitters configured to emit acoustic waves which travel at least partially across a radiation beam conduit to modify a wavefront of a radiation beam passing through the radiation beam conduit, and a control system configured to variably control at least two emitters of the plurality of acoustic emitters to adjust a phase of the acoustic waves from a first emitter of the at least two emitters to be different than a phase of the acoustic waves from a second emitter of the at least two emitters for a same time when the first emitter and the second emitter emit acoustic waves to the radiation beam conduit.
A device manufacturing method comprising:
- using a projection system to project a patterned radiation beam onto a target portion of a substrate;
- using acoustic emitters to emit acoustic waves which travel at least partially across a radiation beam conduit through which the radiation beam, patterned or not, passes prior to being incident upon the substrate;
- and
- variably controlling at least two emitters of the plurality of acoustic emitters to adjust a phase of the acoustic waves from a first emitter of the at least two emitters to be different than a phase of the acoustic waves from a second emitter of the at least two emitters for a same time when the first emitter and the second emitter emit acoustic waves to the radiation beam conduit.
Dependencies are inferred from the claim text.