Exposure mask, exposure apparatus, and method for manufacturing display substrate
AssigneeBoe Technology Group Co., Ltd.
InventorsXuan He, Wei Guo
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Abstract
The present invention discloses an exposure mask, an exposure apparatus, and a method for manufacturing a display substrate, which are used for forming a pattern with a smaller aperture, a narrower slit, or a line of smaller width on a photoresist layer. The exposure mask includes a mask body and an anti-diffraction film layer located at a light emergent side of the mask body. Wherein the mask body includes a light transmissive region and a light non-transmissive region; a region of the anti-diffraction film layer which corresponds to at least the light transmissive region of the mask body is a light transmissive region; and the anti-diffraction film layer is a film layer whose refractive index n satisfies n>1.
Claims15
An exposure mask, including a mask body and an anti-diffraction film layer located at a light emergent side of the mask body, wherein,
- the mask body includes a light transmissive region and a light non-transmissive region;
- a region of the anti-diffraction film layer is a film layer whose entirety is light transmissive;
- and
- the anti-diffraction film layer is a film layer whose refractive index n satisfies n>1,
- wherein the anti-diffraction film layer is detachably connected to the mask body.
An exposure apparatus on which an exposure mask is arranged, wherein the exposure mask includes a mask body and an anti-diffraction film layer located at a light emergent side of the mask body, wherein,
- the mask body includes a light transmissive region and a light non-transmissive region;
- a region of the anti-diffraction film layer is a film layer whose entirety is light transmissive;
- and
- the anti-diffraction film layer is a film layer whose refractive index n satisfies n>1,
- wherein the anti-diffraction film layer id detachably connected to the mask body.
Dependencies are inferred from the claim text.