Cobalt base film-forming method, cobalt base film-forming material, and novel compound

A method for forming a cobalt base film, the method comprising:

• transporting bis(N,N′-diisopropyl-propionamidinate)cobalt to a film formation chamber;
• and
• forming a cobalt base film on a substrate by decomposition of the bis(N,N′-diisopropyl-propionamidinate)cobalt transported to the film formation chamber;
• wherein:
• the film formation process comprises at least a first film formation process and a second film formation process;
• the second film formation process occurs after the first film formation process;
• an internal pressure of the film formation chamber in the first film formation process is higher than an internal pressure of the film formation chamber in the second film formation process;
• in the first film formation process,
• the film formation chamber is supplied with at least NH3 and/or NH3 product compound, and
• the film formation chamber is not supplied with H2;
• in the second film formation process, the film formation chamber is supplied with at least NH3 and/or NH3 product compound, and H2;
• and
• (the H2)/(the NH3 and/or NH3 product compound) is 0.0001 to 2 (molar ratio).