Sputtering apparatus
AssigneeSputtering Components, Inc.
InventorsDaniel Theodore Crowley, Patrick Lawrence Morse, John Robert German
Life of this patent
Estimating the term…
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AssigneeSputtering Components, Inc.
InventorsDaniel Theodore Crowley, Patrick Lawrence Morse, John Robert German
Estimating the term…
A magnetron assembly for a rotary target cathode comprises a rigid support structure, a magnet bar structure movably attached to the rigid support structure, and at least one actuation mechanism coupled to the rigid support structure and configured to change a distance of the magnet bar structure from a surface of a rotatable target cylinder. The magnetron assembly also includes a position indicating mechanism operative to measure a position of the magnet bar structure relative to the surface of the rotatable target cylinder. A communications device is configured to receive command signals from outside of the magnetron assembly and transmit information signals to outside of the magnetron assembly.
A rotary cathode assembly for a sputtering apparatus, the rotary cathode assembly comprising:
A rotary cathode assembly for a sputtering apparatus, the rotary cathode assembly comprising:
Dependencies are inferred from the claim text.