Lithographic apparatus, excimer laser and device manufacturing method

A system comprising:

• an excimer laser arranged to produce radiation to expose a radiation-sensitive surface of a substrate in a first lithographic apparatus;
• and
• a control system configured to receive or determine a parameter of a feature of a pattern as printed on the first lithographic apparatus and to receive or determine the parameter of a feature of a pattern as printed on a second lithographic apparatus, the control system further arranged to control the spectral distribution of radiant intensity of the radiation, the control system constructed and arranged to adjust the spectral distribution to match the parameter of respectively the first lithographic apparatus and the second lithographic apparatus.

A system comprising:

• a lithographic apparatus configured to project radiation onto a radiation-sensitive surface of a substrate;
• and
• a control system arranged to control the spectral distribution of radiant intensity of the radiation, the control system constructed and arranged to adjust the spectral distribution to a selected spectral distribution by supplying a signal representative for the selected spectral distribution of the radiation to an excimer laser optically connected to the lithographic apparatus, the selected spectral distribution being different than a nominal design spectral distribution for the lithographic apparatus, wherein the control system is configured to determine the signal using data relating to a feature in a pattern, the pattern being that of a patterning device used to modulate the radiation for projection onto the radiation-sensitive surface and the selected spectral distribution is arranged to reduce an optical proximity effect in projection of the pattern.