Method for the production of layers containing indium oxide
AssigneeEvonik Degussa GmbH
InventorsJuergen Steiger, Duy Vu Pham, Heiko Thiem, Alexey Merkulov, Arne Hoppe
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Abstract
The present invention relates to a liquid phase process for producing indium oxide-containing layers from nonaqueous solution, in which an anhydrous composition containing at least one indium oxo alkoxide of the generic formula MxOy(OR)z[O(R′O)cH]aXb[R″OH]d where x=3-25, y=1-10, z=3-50, a=0-25, b=0-20, c=0-1, d=0-25, M=In, R, R′, R″=organic radical, X=F, Cl, Br, I and at least one solvent are applied to a substrate, optionally dried, and converted to an indium oxide-containing layer, to the layers producible by the process according to the invention and to the use thereof.
Claims19
A liquid phase process for producing an indium oxide-comprising layer, the process comprising:
- (a) applying an anhydrous solution comprising an indium oxo alkoxide and a solvent, to obtain a substrate coated with an intermediate layer;
- (b) optionally, drying the coated substrate;
- and
- (c) converting the intermediate layer, to obtain a substrate coated with the indium oxide-comprising layer,
- wherein the indium oxo alkoxide has a formula (I):
- MxOy(OR)z[O(R′O)cH]aXb[R″OH]d (I),
- wherein
- x is 3-25, y is 1-10, z is 3-50, a is 0-25, b is 0-20, c is 0-1, d is 0-25,
- M is In,
- R, R′, and R″ are each independently an organic radical, and
- X is F, Cl, Br, or I.
Dependencies are inferred from the claim text.