Semiconductor device
AssigneeKabushiki Kaisha Toshiba
InventorsShinichiro Misu, Kazutoshi Nakamura
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AssigneeKabushiki Kaisha Toshiba
InventorsShinichiro Misu, Kazutoshi Nakamura
Estimating the term…
This device includes a first base layer of a first conduction type. A second base-layer of a second conduction type is provided above the first base-layer. A first semiconductor layer of the first conduction type is above an opposite side of the second base-layer to the first base-layer. A second semiconductor layer of the second conduction type is above an opposite side of the first base-layer to the second base-layer. A plurality of first electrodes are provided at the first semiconductor layer and the second base-layer via first insulating films. A second electrode is provided between adjacent ones of the first electrodes and provided at the first semiconductor layer and the second base-layer via a second insulating film. A resistance of the first base-layer above a side of the second electrode is lower than a resistance of the first base-layer above a side of the first electrodes.
A semiconductor device comprising:
Dependencies are inferred from the claim text.