Substrate processing apparatus, substrate processing method and storage medium

A substrate processing method executed in a substrate processing apparatus including a substrate holding unit, a rotation driving unit, a first chemical liquid nozzle, a second chemical liquid nozzle, a first chemical liquid supplying and a second chemical liquid supplying unit, the substrate processing method comprising:

• rotating, by the rotation driving unit, the substrate holding unit that holds a substrate in a horizontal direction in a first rotation direction;
• discharging, by the first chemical liquid nozzle, a first chemical liquid to a first chemical liquid supplying position on the peripheral portion of the substrate when the substrate holding unit is rotated in the first rotation direction, thereby performing a liquid processing for the peripheral portion of the substrate by the first chemical liquid while rotating the substrate held by the substrate holding unit in the first rotation direction;
• rotating, by the rotation driving unit, the substrate holding unit in a second rotation direction which is opposite to the first rotation direction;
• and
• discharging, by the second chemical liquid nozzle, a second chemical liquid different from the first chemical liquid to a second chemical liquid supplying position on the peripheral portion of the substrate by a second chemical liquid nozzle when the substrate holding unit is rotated in the second rotation direction, thereby performing the liquid processing for the peripheral portion of the substrate by the second chemical liquid while rotating the substrate held by the substrate holding unit in the second rotation direction,
• wherein the substrate processing apparatus further comprises a control unit configured to control:
• the first chemical liquid nozzle to discharge the first chemical liquid while rotating the substrate holding unit in the first rotation direction, and
• the second chemical liquid nozzle to discharge the second chemical liquid while rotating the substrate holding unit in the second rotation direction, and
• wherein the first chemical liquid supplying unit is connected to the first chemical liquid nozzle and is configured to supply the first chemical liquid to the first chemical liquid nozzle,
• the second chemical liquid supplying unit is connected to the second chemical liquid nozzle and is configured to supply the second chemical liquid to the second chemical liquid nozzle,
• the first chemical liquid nozzle is configured such that a discharging direction of the first chemical liquid to be discharged is inclined into the first rotation direction, and
• the second chemical liquid nozzle is configured such that a discharging direction of the second chemical liquid to be discharged is inclined into the second rotation direction.

A storage medium that stores a computer program that, when executed, causes a computer to perform a substrate processing method executed in a substrate processing apparatus including a substrate holding unit, a rotation driving unit, a first chemical liquid nozzle, a second chemical liquid nozzle, a first chemical liquid supplying and a second chemical liquid supplying in using a substrate processing apparatus, the substrate processing method comprising:

• rotating, by the rotation driving unit, the substrate holding unit that holds a substrate in a horizontal direction in a first rotation direction;
• discharging, by the first chemical liquid nozzle, a first chemical liquid to a first chemical liquid supplying position on the peripheral portion of the substrate when the substrate holding unit is rotated in the first rotation direction, thereby performing a liquid processing for the peripheral portion of the substrate by the first chemical liquid while rotating the substrate held by the substrate holding unit in the first rotation direction;
• rotating, by the rotation driving unit, the substrate holding unit in a second rotation direction which is opposite to the first rotation direction;
• and
• discharging, by the second chemical liquid nozzle, a second chemical liquid different from the first chemical liquid to a second chemical liquid supplying position on the peripheral portion of the substrate by a second chemical liquid nozzle when the substrate holding unit is rotated in the second rotation direction, thereby performing the liquid processing for the peripheral portion of the substrate by the second chemical liquid while rotating the substrate held by the substrate holding unit in the second rotation direction,
• wherein the substrate processing apparatus further comprises a control unit configured to control:
• the first chemical liquid nozzle to discharge the first chemical liquid while rotating the substrate holding unit in the first rotation direction, and
• the second chemical liquid nozzle to discharge the second chemical liquid while rotating the substrate holding unit in the second rotation direction, and
• wherein the first chemical liquid supplying unit is connected to the first chemical liquid nozzle and is configured to supply the first chemical liquid to the first chemical liquid nozzle,
• the second chemical liquid supplying unit is connected to the second chemical liquid nozzle and is configured to supply the second chemical liquid to the second chemical liquid nozzle,
• the first chemical liquid nozzle is configured such that a discharging direction of the first chemical liquid to be discharged is inclined into the first rotation direction, and
• the second chemical liquid nozzle is configured such that a discharging direction of the second chemical liquid to be discharged is inclined into the second rotation direction.