Exposure apparatus and method for manufacturing article

A method of manufacturing an article, the method comprising steps of:

• exposing a substrate using an exposure apparatus for transferring an image of a pattern formed on an original onto the substrate via a projection optical system;
• and
• developing the exposed substrate
• wherein the exposure apparatus comprises:
• a first detector that detects at least one of substrate-side marks formed on the substrate via an original-side mark formed on the original and the projection optical system;
• a plurality of second detectors that are arranged in a larger number than the first detector and respectively detect the substrate-side marks not via the projection optical system;
• a reference plate that has a plurality of reference marks;
• and
• a control unit configured to control alignment of the original and the substrate,
• wherein the control unit is configured to obtain a first detection result of the plurality of reference marks by the second detectors and to obtain first information relating to a first distance between the plurality of second detectors based on the first detection result,
• wherein the control unit is configured to obtain a second detection result of the identical substrate-side mark by the first detector and the second detectors and to obtain second information relating to a second distance between the first detector and the second detectors based on the second detection result, and
• wherein the control unit is configured to control the alignment of the original and the substrate based on the first information and the second information.