Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorWilhelmus Josephus Box
Life of this patent
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Abstract
A lithographic apparatus includes an illumination system to provide a beam of radiation, a support to support a patterning devices, the patterning devices configured to impart the beam with a pattern in its cross-section, a substrate table to hold a substrate, a projection system to project the patterned beam onto a target portion of the substrate, and a conditioning system to condition the substrate. The conditioning system conditions a non-target portion of the substrate with a conditioning fluid. A method of manufacturing a device includes conditioning a non-target portion of a substrate.
Claims16
A lithographic apparatus, comprising:
- a substrate table configured to hold a substrate during projection of a patterned beam onto a target portion of the substrate;
- and
- a conditioning system constructed to directly condition a non-target portion of the substrate with a conditioning fluid, the conditioning fluid supplied, in use, by the conditioning system in a space between the substrate and the substrate table so that the conditioning fluid comes into contact with the substrate being held by the substrate table,
- wherein the conditioning system includes a plurality of inlets to supply the conditioning fluid to said space and a plurality of outlets to remove the conditioning fluid from said space, said plurality of inlets and plurality of outlets being distributed over an upper surface of the substrate table so that the inlets and outlets are alternately arranged along a length of the substrate table.
A lithographic apparatus, comprising:
- a substrate table configured to hold a substrate during projection of a patterned beam onto a target portion of the substrate;
- and
- a conditioning system constructed to directly condition a non-target portion of the substrate with a conditioning fluid, the conditioning fluid supplied, in use, by the conditioning system in a space between the substrate and the substrate table so that the conditioning fluid comes into contact with the substrate being held by the substrate table,
- wherein the conditioning system includes a plurality of inlets to supply the conditioning fluid to said space and a plurality of outlets to remove the conditioning fluid from said space, said plurality of inlets and plurality of outlets being distributed over an upper surface of the substrate table so that each inlet of the plurality of inlets is provided closer to an adjacent outlet than to an adjacent inlet.
Dependencies are inferred from the claim text.