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US 9,285,686 B2Granted
Lithographic apparatus involving an immersion liquid supply system with an aperture
AssigneeASML Netherlands B.V.
InventorsJeroen Johannes Sophia Maria Mertens, Christiaan Alexander Hoogendam, Hans Jansen, Patricius Aloysius Jacobus Tinnemans, Leon Joseph Marie Van Den Schoor, Sjoerd Nicolaas Lambertus Donders, Bob Streefkerk
Life of this patent
Estimating the term…
Abstract
In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
Claims20
A lithographic projection apparatus, comprising:
- a movable table;
- a projection system arranged to project a beam of onto a substrate, the projection system comprising an optical element nearest the table;
- a liquid supply system configured to provide a liquid to a space between the table and the optical element and to provide the liquid so as to contact a surface, nearest the table, of the optical element, the liquid supply system comprising:
- a liquid confinement structure extending along at least a part of a boundary of the space between the table and the optical element surface, at least part of the liquid confinement structure positioned between the optical element surface and the table and having an open aperture, the aperture having a cross-sectional width smaller than that of the substrate and the table being movable with respect to the at least part of the liquid confinement structure,
- an inlet to supply the liquid to the space above the aperture, the aperture allowing the beam of radiation and liquid from the inlet to pass to the substrate, and
- an outlet in or on the liquid confinement structure, the outlet configured to remove liquid, supplied by the inlet, from the space;
- a degasser unit configured to separate gas from the liquid;
- and
- a filter configured to remove particles from the liquid.
6 more elements
A device manufacturing method, comprising:
- projecting a patterned beam of radiation, using a projection system of a lithographic apparatus, through a liquid onto a radiation-sensitive substrate;
- supplying the liquid from a liquid supply system to a space between a movable table and an optical element, nearest the table, of the projection system, the supplied liquid contacting a surface, nearest the table, of the optical element;
- at least partly confining the liquid in the space using a liquid confinement structure of the liquid supply system, the liquid confinement structure extending along at least a part of a boundary of the space between the optical element surface and the table, at least part of the liquid confinement structure positioned between the optical element surface and the table and the at least part of the liquid confinement structure having an aperture through which the patterned beam passes, wherein the aperture has a cross-sectional width smaller than that of the substrate and liquid is supplied to the space above the aperture and passes through the aperture to the substrate;
- removing liquid, supplied by the inlet, from the space using an outlet of the liquid confinement structure;
- displacing the table with respect to the at least part of the liquid confinement structure;
- degassing the liquid using a degasser unit;
- and
- removing particles from the liquid using a filter.
5 more elements
A lithographic apparatus, comprising:
- a movable table;
- a projection system arranged to project a beam of radiation from a patterning device onto a substrate, the projection system comprising an optical element nearest the table;
- a liquid supply system configured to provide a liquid to a space between the table and the optical element and to provide the liquid so as to contact a surface, nearest the table, of the optical element, the liquid supply system comprising:
- a liquid confinement structure extending along at least a part of a boundary of the space between the table and the optical element surface, at least part of the liquid confinement structure positioned between the optical element surface and the table and having an open aperture, the aperture having a cross-sectional width smaller than that of the substrate and the table being movable with respect to the at least part of the liquid confinement structure,
- an inlet to supply the liquid to the space above the aperture, the aperture allowing the beam of radiation and liquid from the inlet to pass to the substrate, and
- an outlet in or on the liquid confinement structure, the outlet configured to remove liquid, supplied by the inlet, from the space;
- a degasser unit configured to degas the liquid being supplied to the inlet of the liquid confinement structure;
- a temperature sensor configured measure a temperature of the liquid;
- and
- a heat exchanger configured to control the temperature of the liquid.
7 more elements
Dependencies are inferred from the claim text.