Back to results
US 9,285,685 B2Granted
Lithographic apparatus and device manufacturing method
AssigneesASML Netherlands B.V., Carl Zeiss SMT GmbH
InventorsBob Streefkerk, Johannes Jacobus Matheus Baselmans, Adrianus Franciscus Petrus Engelen, Jozef Maria Finders, Paul Gräupner, Johannes Catharinus Hubertus Mulkens, Jan Bernard Plechelmus Van Schoot
Life of this patent
Estimating the term…
Abstract
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Claims20
A lithographic apparatus, comprising:
- a substrate table configured to hold a substrate;
- a projection system configured to project a beam of radiation to be incident on an incident surface of a target portion of the substrate;
- a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, wherein the beam in the space has an optical axis along which the beam is focused;
- and
- a controller configured to actively provide the optical axis of the beam tilted away from orthogonal to the incident surface and/or actively provide the incident surface tilted away from orthogonal to the optical axis of the beam, for during projection of the beam, through the liquid, onto the target portion of the substrate.
2 more elements
A device manufacturing method, comprising:
- providing a liquid to a space between a projection system of a lithographic apparatus and a substrate;
- projecting a beam of radiation, using the projection system, through the liquid along an optical axis to be incident on an incident surface of a target portion of the substrate;
- and
- actively providing the optical axis of the beam tilted away from orthogonal to the incident surface and/or actively providing the incident surface tilted away from orthogonal to the optical axis, for during projecting of the beam onto the target portion.
1 more element
A lithographic apparatus, comprising:
- a substrate table configured to hold a substrate;
- a projection system configured to project a beam of radiation to be incident on an incident surface of a target portion of the substrate;
- a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, wherein the beam in the space has an optical axis along which the beam is focused;
- and
- a controller configured to deliberately provide the optical axis of the beam and incident surface tilted with respect to each other for during projection of the beam, through the liquid, onto the target portion of the substrate.
2 more elements
Dependencies are inferred from the claim text.