Substrate carrying mechanism, substrate processing apparatus, and semiconductor device manufacturing method
AssigneeHitachi Kokusai Electric Inc.
InventorAkira Takahashi
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AssigneeHitachi Kokusai Electric Inc.
InventorAkira Takahashi
Estimating the term…
The present invention provides a substrate carrying mechanism, a substrate processing apparatus, and a semiconductor device manufacturing method that, when carrying a substrate, suppress the generation of scratches and particles caused by substrate deformation, suppress a decrease in substrate holding force due to substrate deformation, and realizes stable high-speed carriage. Namely, the substrate carrying mechanism, the substrate processing apparatus, and the semiconductor device manufacturing method of the present invention include: a plate-like body that becomes a support base body of a substrate that is a carrying subject; and substrate support portions in which plural convex portions disposed on a surface of the plate-like body are placed on a circumference of a circle that is smaller than the diameter of the substrate.
A substrate carrying mechanism used in a carrying mechanism for carrying a substrate to a processing chamber that processes the substrate, the substrate carrying mechanism comprising:
A substrate processing apparatus comprising:
Dependencies are inferred from the claim text.