Methods of patterning substrates

A method of patterning a substrate, comprising:

• forming spaced first features over a substrate, individual of the spaced first features comprising sidewall portions of different composition than material that is laterally between the sidewall portions;
• providing a mixture of immiscible materials between the spaced first features;
• laterally separating at least two of the immiscible materials along at least one elevation between adjacent spaced first features, the laterally separating forming a laterally intermediate region comprising one of the immiscible materials between two laterally outer regions comprising another of the immiscible materials along the one elevation;
• removing the laterally outer regions and removing the material of the spaced first features between the sidewall portions to form spaced second features over the substrate;
• and
• the laterally separating forming the laterally intermediate region to be surrounded laterally on both sides and elevationally top and bottom by the another of the immiscible materials.

A method of patterning a substrate, comprising:

• forming spaced first features over a substrate, individual of the spaced first features comprising sidewall portions of different composition than material that is laterally between the sidewall portions;
• providing a mixture of immiscible materials between the spaced first features;
• laterally separating at least two of the immiscible materials along at least one elevation between adjacent spaced first features, the laterally separating forming a laterally intermediate region comprising one of the immiscible materials between two laterally outer regions comprising another of the immiscible materials along the one elevation;
• removing the laterally outer regions and removing the material of the spaced first features between the sidewall portions to form spaced second features over the substrate;
• and
• the laterally separating-forming an elevationally outermost region comprising the one immiscible material which covers an elevationally innermost region comprising the another immiscible material, the elevationally outermost and innermost regions having a curved interface there-between that individually extends from one sidewall portion to another sidewall portion of immediately adjacent of the spaced first features.

A method of patterning a substrate, comprising:

• forming spaced first features over a substrate, individual of the spaced first features comprising sidewall portions of different composition than material that is laterally between the sidewall portions;
• providing a mixture of immiscible materials between the spaced first features;
• laterally separating at least two of the immiscible materials along at least one elevation between adjacent spaced first features, the laterally separating forming a laterally intermediate region comprising one of the immiscible materials between two laterally outer regions comprising another of the immiscible materials along the one elevation;
• removing the laterally outer regions and removing the material of the spaced first features between the sidewall portions to form spaced second features over the substrate;
• and
• the laterally separating forming an elevationally outermost region comprising the one immiscible material which covers an elevationally innermost region comprising the another immiscible material, the elevationally outermost and innermost regions having a curved interface there-between, the interface being curved elevationally outward and the removing is of the laterally intermediate region, and comprising:
• removing the elevationally outermost region inwardly to expose the elevationally innermost region and forming the lateral outer regions to comprise the one immiscible material elevationally over the another immiscible material;
• and
• after exposing the elevationally innermost region, anisotropically etching the another immiscible material of the remaining of the laterally intermediate region selectively relative to the one immiscible material.

A method of patterning a substrate, comprising:

• forming spaced first features over a substrate, individual of the spaced first features comprising sidewall portions of different composition than material that is laterally between the sidewall portions;
• providing a mixture comprising two immiscible materials between the spaced first features, the mixture comprising equal volumes of the two immiscible materials;
• laterally separating the two immiscible materials along at least one elevation between adjacent spaced first features, the laterally separating forming a laterally intermediate region comprising one of the two immiscible materials between two laterally outer regions comprising the other of the two immiscible materials along the one elevation, sum of volumes of the two laterally outer regions equaling volume of the laterally intermediate region;
• and
• removing the laterally outer regions and removing the material of the spaced first features between the sidewall portions to form spaced second features over the substrate.

A method of patterning a substrate, comprising:

• forming spaced first features over a substrate;
• providing a mixture of immiscible materials between the spaced first features;
• laterally separating at least two of the immiscible materials along at least one elevation between adjacent spaced first features, the laterally separating forming an elevationally outermost region comprising one of the immiscible materials which covers an elevationally innermost region comprising another of the immiscible materials, the elevationally outermost and innermost regions having a curved interface there-between that individually extends from one sidewall to another sidewall of immediately adjacent of the spaced first features;
• and
• after the laterally separating, removing from between adjacent spaced first features one of a) a laterally intermediate region of the two immiscible materials, or b) laterally outer regions of the two immiscible materials that are laterally outward of the laterally intermediate region, to form spaced second features over the substrate.

A method of patterning a substrate, comprising:

• forming spaced first features over a substrate;
• providing a mixture of immiscible materials between the spaced first features;
• laterally separating at least two of the immiscible materials along at least one elevation between adjacent spaced first features, the laterally separating forming an elevationally outermost region comprising one of the immiscible materials which covers an elevationally innermost region comprising another of the immiscible materials, the elevationally outermost and innermost regions having a curved interface there-between;
• after the laterally separating, removing from between adjacent spaced first features one of a) a laterally intermediate region of the two immiscible materials, or b) laterally outer regions of the two immiscible materials that are laterally outward of the laterally intermediate region, to form spaced second features over the substrate;
• the interface being curved elevationally outward;
• the removing being of the laterally intermediate region;
• and comprising:
• removing the elevationally outermost region inwardly to expose the elevationally innermost region and forming the lateral outer regions to comprise the one immiscible material elevationally over the another immiscible material;
• and
• after exposing the elevationally innermost region, anisotropically etching the another immiscible material of remaining of the laterally intermediate region selectively relative to the one immiscible material.

A method of patterning a substrate, comprising:

• forming spaced first features over a substrate;
• providing a mixture of immiscible materials between the spaced first features;
• laterally separating at least two of the immiscible materials along at least one elevation between adjacent spaced first features, the laterally separating forming an elevationally outermost region comprising one of the immiscible materials which covers an elevationally innermost region comprising another of the immiscible materials, the elevationally outermost and innermost regions having a curved interface there-between;
• after the laterally separating, removing from between adjacent spaced first features one of a) a laterally intermediate region of the two immiscible materials, or b) laterally outer regions of the two immiscible materials that are laterally outward of the laterally intermediate region, to form spaced second features over the substrate;
• the interface being curved elevationally inward;
• the elevationally outermost region comprises the one immiscible material and the elevationally innermost region comprises the another immiscible material;
• and
• the removing is of the laterally intermediate region, the removing comprising:
• removing all of the elevationally outermost region inwardly to expose an elevationally inward curving outer surface of the elevationally innermost region;
• and
• after removing all of the elevationally outermost region, removing the another immiscible material of the elevationally innermost region elevationally inward to the substrate to form remnant of the laterally outer regions to be spaced from one another.