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US 9,176,376 B2Granted
Pattern transfer method and apparatus
AssigneeFUJIFILM Corporation
InventorHiroshi Mataki
Life of this patent
Estimating the term…
Abstract
A method of performing pattern transfer includes the steps of: applying liquid to a substrate, while performing relative movement of the substrate and a liquid ejection head having a plurality of nozzles, by performing ejection and deposition of a plurality of droplets of the liquid from the nozzles onto the substrate in a state where a shape of each of the droplets upon the deposition is not a single circular shape and each of the droplets does not combine with adjacent another of the droplets on the substrate; and curing the liquid that has been applied to the substrate in the applying step while pressing a pattern forming surface of a stamper having a prescribed projection-recess pattern against the liquid.
Claims20
A method of performing pattern transfer, the method comprising:
- applying liquid to a substrate, while performing relative movement of the substrate and a liquid ejection head having a plurality of nozzles, by performing ejection and deposition of a plurality of droplets of the liquid from the nozzles onto the substrate in a state where a shape of each of the droplets upon the deposition is not a single circular shape and each of the droplets does not combine with adjacent another of the droplets on the substrate;
- and
- curing the liquid that has been applied to the substrate in the applying step while pressing a pattern forming surface of a stamper having a prescribed projection-recess pattern against the liquid,
- wherein each of the droplets upon the ejection from the nozzles has a substantially columnar shape and satisfies:
-
-
- l
-
- U
- k
- U
- d
- >
- 2
-
- 3
-
- V
-
- (
- 1
- +
- cos
-
-
- θ
- )
-
- sin
-
-
- θ
- π
-
- (
- 1
- -
- cos
-
-
- θ
- )
-
- (
- 2
- +
- cos
-
-
- θ
- )
- 3
- ,
- where V is a volume of each of the droplets, l is a length of the substantially columnar shape of each of the droplets, Ud is a speed of each of the droplets upon the ejection, Uk is a speed of the relative movement of the substrate and the liquid ejection head, and θ is an angle of contact between each of the droplets and the substrate.
51 more elements
A method of performing pattern transfer, the method comprising:
- applying liquid to a substrate, while performing relative movement of the substrate and a liquid ejection head having a plurality of nozzles, by performing ejection and deposition of a plurality of droplets of the liquid from the nozzles onto the substrate in a state where a shape of each of the droplets upon the deposition is not a single circular shape and each of the droplets does not combine with adjacent another of the droplets on the substrate;
- and
- curing the liquid that has been applied to the substrate in the applying step while pressing a pattern forming surface of a stamper having a prescribed projection-recess pattern against the liquid,
- wherein while the ejection is performed, at least first and second droplets of the liquid are successively ejected from each of the nozzles by each of ejection operations and satisfy:
-
-
- 2
-
- l
-
- U
- k
- U
- s
- >
- 2
-
- 3
-
- V
-
- (
- 1
- +
- cos
-
-
- θ
- )
-
- sin
-
-
- θ
- π
-
- (
- 1
- -
- cos
-
-
- θ
- )
-
- (
- 2
- +
- cos
-
-
- θ
- )
- 3
- ,
- where V is a total volume of the first and second droplets, l is a distance between the first and second droplets upon the deposition on the substrate, Us is a speed of the second droplet upon the ejection, Uk is a speed of the relative movement of the substrate and the liquid ejection head, and θ is an angle of contact between each of the first and second droplets and the substrate.
53 more elements
A pattern transfer apparatus comprising:
- a liquid ejection head which has a plurality of nozzles and performs ejection and deposition of a plurality of droplets of liquid from the nozzles onto a substrate;
- a conveyance device which causes relative movement of the substrate and the liquid ejection head;
- a control device which ensures that a shape of each of the droplets upon the deposition on the substrate is not a single circular shape and each of the droplets does not combine with adjacent another of the droplets on the substrate;
- and
- a curing device which cures the liquid that has been applied to the substrate by the deposition of the droplets while pressing a pattern forming surface of a stamper having a prescribed projection-recess pattern against the liquid,
- wherein each of the droplets upon the ejection from the nozzles has a substantially columnar shape and satisfies:
-
-
- l
-
- U
- k
- U
- d
- >
- 2
-
- 3
-
- V
-
- (
- 1
- +
- cos
-
-
- θ
- )
-
- sin
-
-
- θ
- π
-
- (
- 1
- -
- cos
-
-
- θ
- )
-
- (
- 2
- +
- cos
-
-
- θ
- )
- 3
- ,
- where V is a volume of each of the droplets, l is a length of the substantially columnar shape of each of the droplets, Ud is a speed of each of the droplets upon the ejection, Uk is a speed of the relative movement of the substrate and the liquid ejection head, and θ is an angle of contact between each of the droplets and the substrate.
53 more elements
A pattern transfer apparatus comprising:
- a liquid ejection head which has a plurality of nozzles and performs ejection and deposition of a plurality of droplets of liquid from the nozzles onto a substrate;
- a conveyance device which causes relative movement of the substrate and the liquid ejection head;
- a control device which ensures that a shape of each of the droplets upon the deposition on the substrate is not a single circular shape and each of the droplets does not combine with adjacent another of the droplets on the substrate;
- and
- a curing device which cures the liquid that has been applied to the substrate by the deposition of the droplets while pressing a pattern forming surface of a stamper having a prescribed projection-recess pattern against the liquid,
- wherein while the liquid ejection head performs the ejection, at least first and second droplets of the liquid are successively ejected from each of the nozzles by each of ejection operations and satisfy:
-
-
- 2
-
- l
-
- U
- k
- U
- s
- >
- 2
-
- 3
-
- V
-
- (
- 1
- +
- cos
-
-
- θ
- )
-
- sin
-
-
- θ
- π
-
- (
- 1
- -
- cos
-
-
- θ
- )
-
- (
- 2
- +
- cos
-
-
- θ
- )
- 3
- ,
- where V is a total volume of the first and second droplets, l is a distance between the first and second droplets upon the deposition on the substrate, Us is a speed of the second droplet upon the ejection, Uk is a speed of the relative movement of the substrate and the liquid ejection head, and θ is an angle of contact between each of the first and second droplets and the substrate.
55 more elements
Dependencies are inferred from the claim text.