Pellicle
AssigneeShin-Etsu Chemical Co., Ltd.
InventorKazutoshi Sekihara
Life of this patent
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Abstract
A pellicle is proposed in which the frame is composed of a detachable double structure of an inner frame and an outer frame, and the pellicle membrane is adhered only to the inner frame and the photomask-agglutination layer is laid only to the inner frame, and the outer frame is removed from the inner frame after the pellicle is agglutinated to the photomask.
Claims5
A pellicle comprising:
- a pellicle frame having an upper annular face and a lower annular face,
- a membrane adhered in a slack-free manner to said upper annular face of the pellicle frame, and
- an agglutinant layer attached to the lower annular face of the pellicle frame,
- wherein said frame has a double structure consisting of an inner frame and an outer frame, that said membrane is adhered exclusively to said inner frame and said agglutinant layer is attached exclusively to said inner frame, and that the outer frame is adapted to closely connect with the inner frame detachably.
A method for forming a pattern, comprising agglutinating a pellicle to a photomask using a pressure means, wherein said pellicle comprises a pellicle frame having an upper annular face and a lower annular face, a membrane adhered in a slack-free manner to said upper annular face of the pellicle frame, and an agglutinant layer attached to lower annular face of the pellicle frame, said frame having a double structure consisting of an inner frame and an outer frame, said membrane being adhered exclusively to said inner frame and said agglutinant layer being attached exclusively to said inner frame, and the outer frame being adapted to closely connect with the inner frame detachably, wherein said agglutinating of the pellicle is effected by pressing only said inner frame with said pressure means.
Dependencies are inferred from the claim text.