MEMS device and method of forming the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChin-Wei Liang, Cheng-Yuan Tsai, Chia-Shiung Tsai
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsChin-Wei Liang, Cheng-Yuan Tsai, Chia-Shiung Tsai
Estimating the term…
According to an exemplary embodiment, a method of forming a Micro Electro Mechanical System (MEMS) device is provided. The method includes the following operations: providing a substrate; forming a catalyst layer over the substrate; patterning the catalyst layer; forming a carbon nanotube based on the catalyst layer; forming a getter layer over the carbon nanotube and the substrate; and etching back the getter layer to expose the carbon nanotube. According to an exemplary embodiment, a method of forming a MEMS device is provided. The method includes the following operations: providing a substrate; forming a catalyst island over the substrate; heating the substrate and the catalyst island; contacting the catalyst island with a carbon-containing gas to form a carbon nanotube; forming a getter layer over the carbon nanotube and the substrate; and etching back the getter layer to expose the carbon nanotube.
A method of forming a Micro Electro Mechanical System (MEMS) device, comprising:
A method of forming a Micro Electro Mechanical System (MEMS) device, comprising:
A MEMS device, comprising:
Dependencies are inferred from the claim text.