Process for manufacturing electro-mechanical systems

A method of manufacturing a microelectromechanical system (MEMS) or nanoelectromechanical system (NEMS) composed of a mechanical device and a substrate comprising:

• a) depositing sacrificial silicon oxide between the mechanical device and the substrate;
• b) providing a silicon nitride layer at one or more location selected from the group consisting of
• i) between the substrate and the sacrificial silicon oxide:
• ii) between the sacrificial silicon oxide and the device;
• and
• iii) on the device;
• c) introducing vapor hydrofluoride (VHF) under conditions to simultaneously
• i) remove at least a portion of the sacrificial silicon oxide;
• and
• ii) convert at least a portion of the silicon nitride to ammonium hexafluorosilicate to provide a temporary support, shim, wedge, or tether which limits device movement;
• d) subliming the ammonium hexafluorosilicate under pressure and temperature conditions which avoid liquid formation;
• wherein the temporary ammonium hexafluorosilicate support, shim, wedge, or tether is not removed by sublimation until after one or more intermediate steps are conducted, the intermediate steps selected from dicing, packaging, and metallization, thereby preventing movement during the one or more intermediate steps.