Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method

A device manufacturing method comprising:

• projecting, using a projection system of a lithographic apparatus, a patterned beam of radiation through a liquid onto a substrate creating an exposed substrate, the exposed substrate being held by a substrate table;
• and
• after the projecting is complete, detecting by a residual liquid detector residual liquid on the exposed substrate,
• wherein the remaining liquid on the exposed substrate is detected by the residual liquid detector while the exposed substrate moves, via a path, away from the projection system and before the exposed substrate is conveyed to a holding table where a drying process is applied.

A lithographic projection apparatus comprising:

• a substrate table configured to hold a substrate;
• a projection system arranged to project a patterned beam of radiation onto the substrate;
• a liquid supply system configured to supply liquid to a space between the projection system and the substrate;
• and
• a residual liquid detector configured to detect liquid remaining on the substrate after an exposure of the substrate is completed, wherein the residual liquid detector detects the remaining liquid on the exposed substrate (i) while both the residual liquid detector and the exposed substrate are relatively moved and the exposed substrate moves, via a path along an X-direction of an X-Y coordinate system, away from the space under the projection system and (ii) before the exposed substrate is conveyed to a holding table that holds the exposed substrate.