Fluid handling structure including gas supply and gas recovery openings, lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsRogier Hendrikus Magdalena Cortie, Michel Riepen, Cornelius Maria Rops
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Abstract
A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array.
Claims20
A fluid handling structure for a lithographic apparatus, the fluid handling structure configured to confine immersion fluid to a space, the fluid handling structure comprising:
- a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space;
- a plurality of gas supply openings in a linear array at least partly surrounding and outward, relative to the space, of the meniscus pinning feature;
- and
- a plurality of gas recovery openings in a linear array outward, relative to the space, of the plurality of gas supply openings in a linear array, wherein each space between adjacent gas supply openings of the plurality of gas supply openings in a linear array has a corresponding gas recovery opening of the plurality of gas recovery openings in a linear array, and each space between adjacent gas recovery openings has a corresponding gas supply opening such that the corresponding gas supply opening is positioned directly radially inward of each respective space between adjacent gas recovery openings.
A lithographic apparatus, comprising:
- a substrate table configured to hold a substrate;
- a projection system configured to project a patterned beam on the substrate;
- and
- a fluid handling structure configured to confine immersion fluid to a space between the projection system and the substrate table, the fluid handling structure comprising:
- a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space,
- a plurality of gas supply openings in a linear array at least partly surrounding and outward, relative to the space, of the meniscus pinning feature, and
- a plurality of gas recovery openings in a linear array outward, relative to the space, of the plurality of gas supply openings in a linear array, wherein each space between adjacent gas supply openings of the plurality of gas supply openings in a linear array has a corresponding gas recovery opening of the plurality of gas recovery openings in a linear array, and each space between adjacent gas recovery openings has a corresponding gas supply opening such that the corresponding gas supply opening is positioned directly radially inward of each respective space between adjacent gas recovery openings.
A device manufacturing method, comprising:
- projecting a patterned beam of radiation through an immersion liquid confined to a space between a projection system and a substrate;
- providing gas through a plurality of gas supply openings in a linear array to a position adjacent a meniscus of the immersion liquid;
- and
- recovering liquid which passes through adjacent gas supply openings of the plurality of gas supply openings in a linear array through a plurality of gas recovery openings in a linear array radially outward of the plurality of gas supply openings in a linear array, wherein each space between adjacent gas supply openings of the plurality of gas supply openings in a linear array has a corresponding gas recovery opening of the plurality of gas recovery openings in a linear array, and each space between adjacent gas recovery openings has a corresponding gas supply opening such that the corresponding gas supply opening is positioned directly radially inward of each respective space between adjacent gas recovery openings.
Dependencies are inferred from the claim text.