Chamber and extreme ultraviolet light generation apparatus

A chamber used in an extreme ultraviolet light generation apparatus that generates extreme ultraviolet light by irradiating a target material with a laser beam, the chamber comprising:

• a chamber receptacle;
• a heat shield, disposed within the chamber receptacle between a predetermined region where the target material turns into plasma and the chamber receptacle, configured to absorb heat produced at the predetermined region when the target material turns into plasma;
• and
• a plurality of support portions configured to attach the heat shield to the chamber receptacle,
• the heat shield being cylindrical in shape and extending from an entry side of the laser beam to an output side of the extreme ultraviolet light;
• and
• the heat shield including a slot that extends from one end of the heat shield to the other end of the heat shield and that is configured to expand/contract in response to the thermal deformation of the heat shield,
• wherein the heat shield includes a plurality of slits that extend from the one end of the heat shield to the other end of the heat shield and that are configured to expand/contract in response to the thermal deformation of the heat shield;
• the heat shield is divided into a plurality of portions by the plurality of slits;
• and
• the plurality of portions resulting from the division are attached to the chamber receptacle by plurality of support portions, respectively.