Electron beam lithography with linear column array and rotary stage

A method of electron beam lithography, the method comprising:

• rotating a platen holding a plurality of wafers evenly spaced on the platen around a center region of the platen;
• and
• writing a lithography pattern using a first linear array of reflection electron beam lithography columns positioned over a first wafer held on the platen and a second linear array of reflection election beam lithography columns positioned over a second wafer held on the platen,
• wherein the first and second linear arrays are arranged along a diameter of the platen and on opposite sides across the center of the platen.

A method for writing a lithography pattern to target substrates, the method comprising:

• holding a plurality of target substrates evenly spaced around a center region of a platen;
• and
• writing the lithography pattern onto a first target substrate of the plurality of target substrates underneath a first linear array of electron beam columns and onto a second target substrate of the plurality of target substrates underneath a second linear array of electron beam columns,
• wherein the first and second linear arrays are arranged along a diameter of the platen and on opposite sides across the center of the platen.