Method for pattern formation, method and composition for resist underlayer film formation, and resist underlayer film

A method for forming a pattern, the method comprising:

• (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition comprising a polymer comprising a structural unit derived from (A) a compound comprising a group represented by the following formula (1):
• wherein, in the formula (1), R represents a monovalent organic group having 1 to 30 carbon atoms, the monovalent organic group represented by R does not include an oxygen atom at the end of the side adjacent the sulfur atom, and * represents a bonding hand;
• (2) forming a resist coating film by applying a resist composition on the resist underlayer film;
• (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation;
• (4) forming a resist pattern by developing the exposed resist coating film;
• and
• (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask,
• wherein the compound (A) comprises at least one ring selected from the group consisting of an aromatic ring and a heteroaromatic ring, and the bonding hand denoted by * in the group represented by the above formula (1) bonds via an oxygen atom with the aromatic ring or the heteroaromatic ring.