Polymerizable tertiary ester compound, polymer, resist composition, and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYuki Suka, Jun Hatakeyama, Koji Hasegawa
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AssigneeShin-Etsu Chemical Co., Ltd.
InventorsYuki Suka, Jun Hatakeyama, Koji Hasegawa
Estimating the term…
The present invention provides a polymerizable tertiary ester compound represented by the following general formula (1a) or (1b). There is provided a polymerizable ester compound useful as a monomer for a base resin of a resist composition having a high resolution and a reduced pattern edge roughness in photolithography using a high-energy beam such as an ArF excimer laser light as a light source, especially in immersion lithography, a polymer containing a polymer of the ester compound, a resist composition containing the polymer as a base resin, and a patterning process using the resist composition.
A polymerizable tertiary ester compound represented by the following general formula (1a) or (1b),
A polymer comprising any one or more kinds of repeating units represented by the following general formulae (2a) and (2b),
Dependencies are inferred from the claim text.