Method for producing transparent conductive film, transparent conductive film, transparent conductive substrate and device comprising the same

A method for producing a transparent conductive film, comprising the steps of:

• (a) coating a heat-resistant substrate with a coating liquid to form a transparent conductive coating film containing an organic metal compound as a main component and an organic metal compound as a dopant;
• (b) drying the transparent conductive coating film to form a dried coating film;
• (c) baking the dried coating film obtained in step (b) to form an inorganic film containing an inorganic component comprising a metal oxide containing a dopant metal compound as a main component by heating to at least a baking temperature at which at least the inorganic component is crystallized in an oxygen-containing atmosphere having a dewpoint of −10° C. or lower, whereby an organic component contained in the dried coating film is removed therefrom by heat decomposition, combustion or a combination thereof to thereby form a conductive oxide microparticle layer densely filled with conductive oxide microparticles containing the metal oxide as a main component and the dopant metal compound, wherein the organic metal compound comprises of at least one compound selected from the group consisting of organic indium compounds, organic tin compounds and organic zinc compounds, and wherein the metal oxide consists of at least one member of the oxides selected from indium oxide, tin oxide and zinc oxide, and
• (d) subsequent to step (c) baking at a temperature of 300° C. or higher under an oxygen-containing atmosphere having a dewpoint of 0° C. or higher.