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US 9,039,957 B2Granted
Target material refinement device and target supply apparatus
AssigneeGigaphoton Inc.
InventorsYutaka Shiraishi, Osamu Wakabayashi
Life of this patent
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Abstract
A target material refinement device may include a refinement tank to accommodate a target material, a heating section to heat the interior of the refinement tank, and an oxygen-atom removing section to remove oxygen atoms present in the target material.
Claims9
A target material refinement device that refines a target material used for generation of EUV light, comprising:
- a refinement tank configured to accommodate a target material;
- a heating section configured to heat an interior of the refinement tank;
- and
- an oxygen-atom removing section configured to remove oxygen atoms present in the target material, wherein
- the oxygen-atom removing section includes:
- a reduction section configured to reduce the oxygen atoms;
- and
- an exhaust section to evacuate the interior of the refinement tank, and
- the reduction section includes a gettering substance that generates oxidants with the oxygen atoms.
6 more elements
Dependencies are inferred from the claim text.