Method for producing an antireflection coating
AssigneeFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
InventorsUlrike Schulz, Peter Munzert, Friedrich Rickelt, Norbert Kaiser
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AssigneeFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
InventorsUlrike Schulz, Peter Munzert, Friedrich Rickelt, Norbert Kaiser
Estimating the term…
A method for producing an antireflection coating on a substrate is specified. A first nanostructure in a first material is formed using by means of a first plasma etching process. The first material is the material of the substrate or the material of a layer made of a first organic material applied onto the substrate. A layer made of a second material is applied onto the first nanostructure, the second material is an organic material. A second nanostructure is formed in the layer made of the second material using a second plasma etching process. The second material has a higher etching rate than the first material when carrying out the second plasma etching process.
A method for producing an antireflection coating on a substrate, the method comprising:
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