Method for producing a transparent and conductive metal oxide layer by highly ionized pulsed magnetron sputtering
AssigneeFraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.
InventorsFelix Horstmann, Volker Sittinger, Bernd Szyszka
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Abstract
A method for producing a transparent and conductive metal oxide layer on a substrate, includes atomizing at least one component of the metal oxide layer by highly ionized, high power pulsed magnetron sputtering to condense on the substrate. The pulses of the magnetron have a peak power density of more than 1.5 kW/cm2, the pulses of the magnetron have a duration of ≦200 μs, and the average increase in current density during ignition of the plasma within an interval, which is ≦0.025 ms, is at least 106 A/(ms cm2).
Claims18
A method for producing a transparent and conductive metal oxide layer on a substrate, the method comprising the following steps:
- atomizing at least one component of the metal oxide layer by highly ionized pulsed high-power magnetron sputtering and condensing the at least one component on the substrate;
- providing the pulses of the magnetron with a peak power density of greater than 1.5 kW/cm2;
- providing the pulses of the magnetron with a duration of ≦200 μs;
- and
- providing an average increase in current density during ignition of the plasma of at least 106 A/(ms cm2) within a time interval of ≦0.025 ms.
Dependencies are inferred from the claim text.